With the demands of new practice function about thin films in the market,sputtering technology have a great development in scientific research and industrial manufacture field , To investigate the preparation of thin metal films by Sputtering method and its properties. The preparation of thin metal films on glass bases by DC dipole sputtering,and test the thin metal films of thickness,electrical properties, and uniformity,repeatability. The relationship between the thickness of sputtered films and working time were analyzed using weighing method; The morphology of metal films was studied using scanning electron microscopy and Optical microscope ,analysed the thin metal films'properties, step coverage, smoothness, adhesiveness.
The results show that on the same conditions, thickness of sputtered films and Sputtering time present the linear relationship ,Thickness of sputtered films increase simply with the increasing of Sputtering time.Sputtered films have features that Center high around to decline and better Step coverage.
Keywords:Sputtering Preparation of thin films Metal film Properties
目 录
中文摘要 i
英文摘要 ii
目录 iii
第一章 绪论 1
1.1 薄膜背景介绍 1
1.2 薄膜制作工艺介绍 1
1.3 研究内容 2
第二章 溅射工艺技术 3
2.1 溅射原理与主要方式 3
2.2 工艺参数对薄膜性质的影响 4
2.3 溅射特性 5
第三章 薄膜制备及其特性研究 6
3.1 薄膜制备 6
3.2 膜的特性研究 6
3.2.1前处理对附着性的影响 6
3.2.2膜厚 7
3.2.3方块电阻 9
3.2.4金属膜台阶覆盖性 11
第四章 结论 13
致谢 14
参考文献 15